Woburn, MA – July 19, 2006 – Energetiq Technology, Inc. a developer and manufacturer of advanced short wavelength light products, is pleased to announce that R&D Magazine has awarded one of its coveted R&D 100 Awards to Energetiq for its EQ-10 EUV Light Source as one of the 100 most technologically significant products introduced into the marketplace in the last year.
“We are delighted to have received such a prestigious award for our EQ-10 EUV source. The introduction of the Energetiq EUV source enables researchers to develop the EUV infrastructure needed to support EUV lithography,” said Paul Blackborow, CEO of Energetiq. “We are pleased with the acceptance of our technology to the marketplace.”
Energetiq’s EQ-10, which was introduced to the market in 2005, features Energetiq's proprietary Electrodeless Z-PinchTM technology and produces 10 Watts of stable, repeatable EUV light for a variety of applications. The Energetiq Electrodeless source design is proven to run continuously and have highly repeatable performance. The plasma size is below 500 microns in diameter under typical operating conditions and yields a 13.5nm EUV output of 10W (± 1% bandwidth) or 20W (± 3.5% bandwidth) into 2pi steradians with a controllable repetition rate up to 1.5 kHz.
The EQ-10 is now installed at major EUV technology centers in the USA, Europe and Asia. The source is finding application in the testing and qualification of advanced photoresists, the testing of EUV mirrors, EUV microscopy and other advanced applications.
The R&D 100 awards known as the "The Oscars of Invention", now in its 44th year, names the most innovative new products introduced into the marketplace. The awards are judged by an independent panel of outside experts. R&D Magazine will list the 100 winners in its September issue.
About Energetiq Technology, Inc.
Energetiq, based in Woburn, Massachusetts, was founded in March 2004 with a mission to be the preeminent developer and manufacturer of short wavelength light sources for use in the analysis and fabrication of nano-scale structures and products. Members of the Energetiq team have been responsible for developing many high power plasma sources that run daily in semiconductor fabrication facilities around the world. Energetiq’s goal is to leverage this expertise to develop novel, cost-effective, short wavelength light sources that enable the production of next generation devices. The company’s products cover the Deep Ultraviolet (DUV), Extreme Ultraviolet (EUV) and Soft X-Ray (SXR) wavelength range from 400nm to 1nm (nanometer) and can be used in lithography, metrology, inspection, resist and thin-film processing and R&D applications. For more information, visit www.energetiq.com