10 Watt EUV Source
Enables EUV Lithography
The EQ-10R is a perfect choice for EUV research and development projects.
For researchers in EUV lithography, existing sources of light are often too low in power, unreliable in operation, large, costly, and complex.
The EQ-10R is a compact, easy-to-use, reliable, and cost-effective EUV light source, based on Energetiq's proven Electrodeless Z-Pinch™ technology using Xenon gas. With over 30 EQ-10R units installed around the world, it has become the workhorse for the EUV community through its proven reliability, ease of use, and low operating cost. Its modular design makes it easy to integrate into your process.
The system includes the Electrodeless Z-Pinch™ source assembly, vacuum and gas subsystems, power delivery subsystem, and control electronics. The EQ-10R is capable of delivering up to 10 Watts of in-band EUV into 2 pi steradians, and will run continuously at pulse repetition rates of up to 2 kHz.
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Unique patent-pending Electrodeless Z-Pinch™ technology
Low debris / low consumable cost
10 W into 2 pi using Xenon
Sufficient power for a wide variety of applications
Up to 2 kHz repetition rate
Continuous mode, 24/7
Small plasma size
Below 1 mm diameter
Cost-effective and compact
Low cost per EUV Watt
CE-Mark and SEMI S2-0715 compliant
EUV Resist Development
Electrodeless Z-Pinch Technology
Clean Operation, Small Plasma Size, and Maximum Flexibility
- Clean operation with no electrode debris and magnetically confined plasma
- Unmatched spatial stability
- Lower cost and complexity
- Flexible, adjustable operating conditions
- Optimized for peak power or peak brightness
- Small plasma size (typically below 1 mm in diameter)
- Simple, flexible, customizable optical interface with color touch screen display
- Manual and automatic operation
US 7,307,375 -- US 7,948,185 -- DE 1774838 -- DE 2187711 -- GB 1774838 -- GB 2187711 -- JP 5179175 -- KR 10-1173324
NL 1774838 -- NL 2187711 -- US 8,143,790 -- US 7,199,384 -- US 7,183,717 -- US 7,569,791 -- US 8,019,043