Albany, NY – July 5, 2005 – Albany NanoTech, a leading global center for nanotechnology research, development and deployment, today announced the delivery of a new state of the art tool for extreme ultraviolet (EUV) lithography research, built by Energetiq Technology, Inc., a developer and manufacturer of advanced short wavelength light products for use in high technology applications.
The new tool, the EQ-10M, is a 10 watt, high brightness EUV light source which will be used for metrology research applications at the UAlbany College of Nanoscale Science and Engineering (CNSE) at Albany NanoTech, the first college in the nation devoted exclusively to the study of nanoscale scientific concepts. The EQ-10M, based on Energetiq’s unique Electrodeless Z-PinchTM technology, is among the most advanced tools of its kind in the world and will serve to further augment Albany NanoTech's capabilities as a global center for advanced lithography research.
"Energetiq has developed a truly innovative EUV light source that is likely to significantly enhance EUV metrology, making mask inspection faster as well as more reliable and cost-effective," said Gregory Denbeaux, Ph.D., Assistant Professor of Nanoscience at CNSE. "This tool will play a significant role in our lithography research program as we move to 13.5 nm lithography - the most advanced research taking place today."
"We are delighted to collaborate with the world-class EUV group at UAlbany. With our Electrodeless Z-Pinch technology, we have developed an EUV source that is robust, flexible and cost effective. Our technology provides researchers with the EUV power and high brightness needed for advanced applications," stated Paul Blackborow, CEO of Energetiq. "By enabling Dr. Denbeaux's research in advanced metrology we hope to keep EUV lithography on track to reach high volume manufacturing by the end of the decade.”
Lithography is the process of using light to imprint patterns on semiconductor materials that are used for integrated circuits. Lithography is one of the key technologies that has enabled the semiconductor industry to meet the challenge of Moore's Law by allowing a 30% decrease in the size of printed dimensions every two years. EUV lithography is central to the future miniaturization of semiconductor devices since it deals in light with a a wavelength of approximately 13.5 nanometers, significantly smaller than the current 193 nm tools currently used in semiconductor manufacturing.
EUV discharge plasma sources produce light by passing a current through a gas, causing the atoms in the gas to heat sufficiently that they emit the very short wavelength EUV light. Traditionally, EUV sources have used a pair of electrodes through which the current is passed. These electrodes can overheat causing debris that may end up in the optical system. The Energetiq EQ-10M is distinct in that it employs an electrode-free technology by coupling the current inductively into the discharge plasma.
Professor Denbeaux's research focuses on high resolution imaging, which requires a very small, bright point source of light. Using Xenon gas, which is simple to manipulate and non-toxic, the EQ-10M is designed to make a very small plasma producing a bright, high-powered light source. The EQ-10M will be up and running for experimentation by July 2005.
About Albany NanoTechOne of the largest global centers for nanotechnology, Albany NanoTech is home to the College of Nanoscale Science and Engineering (CNSE) and the New York State Center of Excellence in Nanoelectronics (NYSCEN) of the University at Albany-State University of New York. Its 450,000 square foot complex, including the only 200mm/300mm wafer facilities in the academic world, encompasses nanoelectronics, system-on-a-chip technologies, biochips, optoelectronics and photonics devices, closed-loop sensors for monitoring, detection, and protection, and ultra-high-speed communication components. With over 65,000 square fee of Class 1 capable 300 mm wafer cleanrooms, as well as on-site faculty and student researchers, Albany NanoTech provides corporate partners with a unique environment to pioneer, develop, and test new nanoscience and nanoengineering innovations within a technically aggressive and financially competitive R&D environment. For more information, visit our website at www.albanynanotech.org
About Energetiq Technology, Inc.Energetiq, based in Woburn, Massachusetts, was founded in March 2004 with a mission to be the preeminent developer and manufacturer of short wavelength light sources for use in the analysis and fabrication of nano-scale structures and products. Members of the Energetiq team have been responsible for developing many high power plasma sources that run daily in semiconductor fabrication facilities around the world. Energetiq’s goal is to leverage this expertise to develop novel, cost-effective, short wavelength light sources that enable the production of next generation devices. The company’s products cover the Deep Ultraviolet (DUV), Extreme Ultraviolet (EUV) and Soft X-Ray (SXR) wavelength range from 400nm to 1nm (nanometer) and can be used in lithography, metrology, inspection, resist and thin-film processing and R&D applications. For more information, visit www.energetiq.com