Extreme Ultraviolet Light Sources
Compact, Reliable EUV Using Electrodeless
Z-Pinch™ Technology
EQS-10
EQ-10R
EQ-10R-HP
EQ-10R-SXR
Modular Design for Easy Integration
Energetiq’s uniquely designed EUV light sources minimize heat load and reduce debris, giving you control over peak brightness and peak power in a compact, modular unit.
Advancements in fields such as semiconductor lithography, mask blank inspection, materials research and life sciences research rely on plasma-based light sources that generate radiation between the deep ultraviolet and x-ray regions (10 to 50 nm). Traditional method of producing extreme UV light uses electrodes, which generate heat and produce unwanted debris – not suitable for production environments.
Energetiq’s Electrodeless Z-Pinch™ EUV sources use a patented design that inductively couples the current into the plasma to generate ultrashort-wavelength UV radiation in a clean, cool way. The modular design delivers high up-time and field-proven reliability with the flexibility of user-controlled outputs for optimized power and brightness.
- Ease of use and reliability suitable for photoresist R&D
- Minimal heat load
- Excellent spatial stability
- High repetition rate
- Stable, repeatable power output
- Simple, flexible optical interface
- CE Mark and SEMI S2-0715 compliant
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How It Works
Extreme UV / Soft X-Ray Data Sheets
EQS-10 Data Sheet
EQ-10R Data Sheet
EQ-10R-HP Data Sheet
EQ-10R-SXR Data Sheet
Electrodeless Z-Pinch™ Technology
Clean Operation, Small Plasma Size, and Maximum Flexibility
Energetiq’s unique technology is also based on a Z-pinch plasma, but it avoids electrodes entirely by inductively coupling the current into the plasma. The plasma in the Energetiq source is magnetically confined away from the source walls, minimizing the heat load and reducing debris.
| EQS-10 | EQ-10R-HP | EQ-10R-SXR | |
|---|---|---|---|
|
Typical Output Power |
40 W*
|
20 W*
|
400 mW✝
|
|
Typical Brightness |
12 W/mm².sr
|
8 W/mm².sr
|
N/A
|
|
Pulse Rate |
Up to 5 kHz
|
Up to 2.5 kHz
|
Up to 2 kHz
|
|
Target Gas |
Xenon
|
Xenon
|
Nitrogen
|
|
Applications |
EUV Metrology
EUV Microscopy Materials Research |
Metrology
Microscopy Inspection |
Water-Window Microscopy
Optics Testing |
*Power into 2π steradians (13.5nm ±1% bandwidth).✝Power into 2π steradians (2.8nm line emission).
Note: Performance measures in this Selection Guide are typical values for guidance in the selection and use of the EQ-10 Series products. They are not to be taken as specifications. Please Contact Energetiq for further details: info@energetiq.com.
Resources
“Affordable X-Ray Microscopy with Nanoscale Resolution" in BioOptics World, March/April 2013, by James E. Evans, Paul Blackborow, Stephen F. Horne, and Jeff Gelb [Article]
“Infrastructure Steps Closer to EUV Lithography” in Semiconductor International, September 2005, by Aaron Hand, Managing Editor of Semiconductor International [Article]
Your exacting system demands are our top concern.
We thrive in working together through the challenges of high brightness, high throughput, and reliable performance in complex systems.
Frequently Asked Questions
What applications is the EQ-10 Series best suited for?
The EQ‑10 Series is widely used in semiconductor inspection, optical metrology, scientific research, and advanced materials development.
Can the EUV output be shaped or directed for specific use cases?
Yes. The EUV beam can be collimated or directed using appropriate optics and alignment tools.
What is the difference between the models in the EQ-10 Series?
The EQ‑10 Series includes several EUV and soft X‑ray light sources built on Energetiq’s Electrodeless Z‑Pinch plasma technology. Each model is optimized for different performance levels and application needs.
EQS‑10 – A next‑generation EUV source delivering up to 40 W at 13.5 nm (±1%) and repetition rates up to 5 kHz. Ideal for EUV metrology, photoresist development, and applications requiring high brightness and throughput.
EQ‑10R – A stable, reliable EUV source providing 10 W‑class performance for general EUV R&D, inspection, and materials research. Designed for long‑term stability and repeatability.
EQ‑10R‑HP – A high‑brightness model offering 20 W EUV output and 8 W/mm²·sr brightness, suitable for metrology, testing, and applications requiring higher photon flux. Operates up to 2.5 kHz.
EQ‑10R‑SXR – A soft X‑ray variant optimized for water‑window microscopy and materials imaging, producing ~400 mW at 2.8 nm.
In short: Choose EQS‑10 for maximum power and speed. Choose EQ‑10R‑HP for high brightness and metrology. Choose EQ‑10R for stable, general‑purpose EUV research. Choose EQ‑10R‑SXR for soft X‑ray imaging applications.