EQ-10

Electrodeless Z-Pinch™
10 Watt EUV Source

Researchers into the emerging technology of EUV
lithography need a source of EUV photons for a
variety of applications. Existing sources of light are
often too low in power, unreliable in operation,
large, costly and complex.

The EQ-10 is a compact, easy-to-use, reliable, and
cost-effective EUV light source, based on Energetiq's
proven Electrodeless Z-pinch™ technology using
Xenon gas. The EQ-10 EUV source is uniquely suited
for metrology and research applications. The EQ-10 has become the workhorse EUV source for the EUV community, through its proven reliability, ease of use, and low operating cost.

The Energetiq EQ-10 EUV Source's modular design makes it ready to be integrated into a process tool. The system includes the electrodeless Z-pinch source assembly, vacuum and gas subsystems, power delivery subsystem, and control electronics. The EQ-10 is capable of delivering up to 10 Watts of in-band EUV into 2pi steradians, and will run continuously at pulse repetition rates of up to 2 kHz.

Features  &  Benefits

  • Unique patent-pending electrodeless Z-Pinch technology
       - Low debris / low consumable cost
  • 10W into 2pi using Xenon
       - Sufficient power for a wide variety of applications
  • Up to 2 kHz repetition rate
       - Continuous mode, 24/7
  • Small plasma size
       - Below 1mm diameter
  • Cost-effective and compact
       - Low cost per EUV Watt
       - Small footprint
  • CE-Mark and SEMI S2-0703 compliant

Industry  Applications

  • EUV Metrology
  • EUV Resist Development
  • Defect Inspection
  • EUV Microscopy

To accommodate the differing requirements of the various applications, the source operating conditions are user-adjustable. The EUV light output can be optimized for peak power or for peak brightness as required by the user. Plasma size is typically below 1mm in diameter under typical operating conditions. A simple and flexible optical interface is provided to the user on the side of the system enclosure to connect to the application equipment. Custom interfaces are available to meet specific customer requirements. The user interface operates by a color touch screen display, and incorporates menus allowing manual and automatic operation.
EUV

• Unique design eliminates electrodes
   and electrode current
 
   - No electrodes – no electrode debris
 
• Plasma is magnetically confined
   away from source components
 
   - Reduces debris further
 
• Magnetic confinement offers
   unexcelled spatial stability
 
• Lower cost and complexity



*Patent Numbers:
US 7,307,375 -- US 7,948,185 -- DE 1774838 -- DE 2187711 -- GB 1774838 -- GB 2187711 -- JP 5179175 -- KR 10-1173324
NL 1774838 -- NL 2187711 -- US 8,143,790 -- US 7,199,384 -- US 7,183,717 -- US 7,569,791 -- US 8,019,043.

EUV  Products

EQ-10

High-Reliability, High-Stability 10 Watt EUV Source for EUV R&D

EQ-10HR

High-Repetition Rate, EUV Source for Accelerated Optics Testing

EQ-10HP

High-Brightness 20 Watt, EUV Source for Metrology and Testing

EQ-10SXR

Soft X-Ray Source for Water-Window Microscopy
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