EQ-10HR

Electrodeless Z-Pinch™
High Repetition Rate 10 kHz EUV Source

EUV sources for HVM are expected to operate at pulse
repetition rates of 10 kHz or higher. To simulate the effects
of operating at such pulse rates on the optics lifetime, for
example, high repetition rate metrology sources are needed.

The Energetiq EQ-10HR EUV Source is a compact, easy-to-use, reliable,
and cost-effective EUV light source, based on Energetiq's proven Electrodeless
Z-pinch™ technology using Xenon gas. The EQ-10HR high repetition rate EUV source is
uniquely suited for metrology and research applications where simulation of HVM is required.

Features  &  Benefits

  • Unique patent-pending electrodeless Z-Pinch technology
       - Low debris / low consumable cost
  • 10 kHz pulse rate
       - Enables high volume manufacturing (HVM) simulation    - Continuous mode, 24/7
  • Small plasma size
       - Below 1mm diameter
  • Cost-effective and compact
       - Small footprint
  • CE-Mark and SEMI S2-0703 compliant

Industry  Applications

  • Accelerated EUV Optics Testing
  • EUV Metrology
  • EUV Resist Development
  • Defect Inspection
  • EUV Microscopy

The EQ-10HR is a stand-alone system, ready to be integrated into a process tool. The system includes the electrodeless Z-pinch source assembly, Maglev vacuum pumping subsystem, gas delivery subsystem, power delivery subsystem, & control electronics. The EQ-10HR is capable of delivering up to 0.5 mJ/pulse of broadband EUV into 2pi steradians, & will run continuously at pulse repetition rates of up 10 kHz.

To accommodate the differing requirements of the various applications, the source operating conditions are user-adjustable. The EUV light output can be optimized for peak power or for peak brightness as required by the user. Plasma size is typically below 1mm in diameter under typical operating conditions. A simple and flexible optical interface is provided to the user on the side of the system enclosure to connect to the application equipment. Custom interfaces are available to meet specific customer requirements. The user interface operates by a color touch screen display, and incorporates menus allowing manual and automatic operation.

The EQ-10HR is easy to install, requiring only electrical power, a chilled water supply, clean dry compressed air and a supply of Xenon.
EUV

• Unique design eliminates electrodes
   and electrode current
 
   - No electrodes – no electrode debris
 
• Plasma is magnetically confined
   away from source components
 
   - Reduces debris further
 
• Magnetic confinement offers
   unexcelled spatial stability
 
• Lower cost and complexity


*Patent Numbers:
US 7,307,375 -- US 7,948,185 -- DE 1774838 -- DE 2187711 -- GB 1774838 -- GB 2187711 -- JP 5179175 -- KR 10-1173324
NL 1774838 -- NL 2187711 -- US 8,143,790 -- US 7,199,384 -- US 7,183,717 -- US 7,569,791 -- US 8,019,043.

EUV  Products

EQ-10

High-Reliability, High-Stability 10 Watt EUV Source for EUV R&D

EQ-10HR

High-Repetition Rate, EUV Source for Accelerated Optics Testing

EQ-10HP

High-Brightness 20 Watt, EUV Source for Metrology and Testing

EQ-10SXR

Soft X-Ray Source for Water-Window Microscopy
Product  Literature and Media


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