Company Recognized for Outstanding Contribution
to Advancement of EUV Lithography Infrastructure
Woburn, MA – July , 2009 – Energetiq Technology, Inc., a developer and manufacturer of specialized short-wavelength light products for advanced technology applications, has been given an Outstanding Contribution Award at the 2009 International Workshop for EUV Lithography for excellent performance of the Energetiq EUV light source and the company’s contribution to EUVL development – one of only two awards presented at the Workshop held last week in Honolulu, Hawaii.
Dr. Gregory Denbeaux, Assistant Professor of Nanoengineering at the College of Nanoscale Science and Engineering (“CNSE”) of the University at Albany and a recognized EUV expert, presented the award to Deborah Gustafson, VP of Marketing and Sales at Energetiq.
“Energetiq has made it possible for researchers to have reliable EUV photons to make EUV lithography become a reality,” said Professor Denbeaux. “Much of today’s research, including cutting-edge work being done at CNSE’s Albany NanoTech Complex, is conducted with the Energetiq EUV light source.”
Gustafson added, “Energetiq is pleased to receive this award and we are happy that we can contribute to the infrastructure development being done today. Moreover, we would like to thank all of our customers for their successful work in this field. Energetiq plans to continue its contribution to the successful implementation of EUV Lithography by working with the mask metrology suppliers to ensure that there is a reliable EUV source for metrology tools.”
Energetiq’s EQ-10 Series EUV Light Source features the company’s proprietary Electrodeless Z-PinchTM technology and produces stable EUV light, with low cost of ownership. The electrodeless source design is proven to run continuously and have highly repeatable performance. The EQ-10 Series is installed at major EUV technology centers in the USA, Europe and Asia, and is used in advanced photoresist testing and qualification, EUV optics testing, EUV microscopy, and most recently with the introduction of a high repetition rate (10 kHz) version, in metrology and research applications where simulation of HVM (High Volume Manufacturing) is required.