Events 2019

February 2 - February 3

SPIE BIOS
San Francisco, CA
website

February 5 - February 7

SPIE Photonics West
San Francisco, CA
website

February 24 - February 25

SPIE Advanced Lithography
San Jose
website

March 20 - March 22

Laser World of Photonics China / Semicon China
Shanghai, China
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April 14 - April 18

SPIE Defense + Commercial Sensing
Baltimore, MD
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May 5 - May 10

CLEO Conference
San Jose, CA
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June 3 - June 6

IEEE International Interconnect Technology Conference
Brussells, Belgium
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June 10 - June 13

UVL Workshop
Berkeley, CA
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June 25 - June 27

Sensors Expo
San Jose, CA
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July 9 - July 11

Semicon West
San Francisco, CA
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August 11 - August 15

SPIE Optics + Photonics
San Diego, CA
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September 16 - September 19

SPIE Advanced Lithography
San Jose
website

September 16 - September 19

Frontiers in Optics
Washington, DC
website

October 19 - October 23

Society for Neuroscience
Chicago, IL
website

Fall 2019

MRS Fall Meeting
Boston, MA


Fall 2019

Source Workshop
Prague, Czech Republic





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Energetiq Technology Introduces High Power,
High Brightness 20-Watt EUV Light Source

Product release program completed for advanced light source used in actinic inspection of EUV masks

Woburn, MA – September 24, 2012 – Energetiq Technology, Inc., a developer and manufacturer of specialized ultrahigh-brightness light sources for advanced technology applications, today announced it has successfully completed its product release program for the EQ-10HP 20-Watt EUV Light Source. Energetiq’s sixth unit for actinic inspection applications of EUV masks is scheduled to ship in the fourth quarter 2012. Energetiq Technology has established a leadership role in providing reliable, stable, cost- effective EUV sources with its EQ-10 Series – the workhorse EUV source for the EUV measurement and testing community. With its latest innovation, the EQ-10HP, Energetiq has been able to build upon that status by providing high 20-Watt power sources to EUV customers developing actinic mask inspection products.

The EQ-10HP high power sources have been running reliably in EUV mask inspection environments for more than a year. By the end of 2012, six EQ-10HP units are expected to have been successfully delivered and installed at customer sites throughout the world. “We are very pleased that our highly reliable EQ- 10 platform has been extended to this high power version to meet the needs of our customers in the U.S., Asia, and Europe,” says Debbie Gustafson, Vice President of Sales and Marketing for Energetiq. “As we complete our product introduction program for the EQ-10HP, we are ready to support increased demand as EUV lithography enters the manufacturing phase.”

The Energetiq EQ-10HP EUV Source operates at substantially higher input powers than its EQ-10 Series predecessors and delivers 20 Watts of in-band EUV into 2pi steradians. Its small, stable, inductively- driven plasma makes it ideal for use in EUV metrology and inspection applications. The modular design of the EQ-10HP enables easy integration into a process tool. The system includes Energetiq’s patented Electrodeless Z-pinch™ source assembly, vacuum and gas subsystems, power delivery subsystem, and control electronics.

For more information on the EQ-10HP and other Energetiq EUV sources, visit click here

About Energetiq Technology, Inc.

Energetiq Technology is the world’s leading developer and manufacturer of ultra-bright broadband light sources for a wide variety of advanced applications in life and materials sciences, semiconductor manufacturing, and R&D. Energetiq's light sources are based on a revolutionary laser-driven light source technology that generates high brightness across the spectrum, with high reliability and long operating life in a compact package. More information about Energetiq is available at www.energetiq.com.


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