10 kHz Source Enables High Volume Manufacturing (HVM) Simulation
Woburn, MA – February 23, 2009 – Energetiq Technology, Inc., a developer and manufacturer of specialized short-wavelength light products for advanced technology applications, announced today that it has developed a new EUV light source, the EQ-10HR that operates at a high pulse rate of 10 kHz to simulate the requirements of high volume manufacturing (HVM) for EUV lithography (EUVL) implementation. Energetiq will exhibit this new technology at SPIE Advanced Lithography in San Jose, CA, February 24–25, 2009.
EUV sources for HVM are expected to operate at pulse repetition rates of 10 kHz or higher. To simulate the effects of operating at such pulse rates on the optics lifetime, for example, high repetition rate metrology sources are needed. Energetiq addresses this need with the new EQ-10HR EUV Source that operates at a10 kHz pulse rate. The EQ-10HR is based upon Energetiq’s innovative EQ-10 EUV Source design, which has become an industry standard EUV metrology source since its introduction in 2005. The original EQ-10 was designed to operate at a pulse frequency of 1 to 2 kHz—a repetition rate below HVM requirements—and its fundamental principle of operation, the Electrodeless Z-Pinch™, has been employed in the EQ-10HR high pulse rate source. Energetiq's patented Electrodeless Z-Pinch technology inductively couples the current into the discharge plasma, making the plasma extremely stable and controllable. The plasma is confined away from source components, reducing debris and allowing very long operating life and very low cost of ownership.
“We are very excited to bring about a reliable, cost-effective solution for producing EUV light in HVM testing,” said Debbie Gustafson, Energetiq’s Vice President of Sales and Service. “Our electrodeless technology is proven to produce EUV light that’s ideal for infrastructure development for EUV lithography as evidenced by the large number of Energetiq EQ-10 EUV systems installed in processing tools around the globe. With the introduction of the higher repetition rate EQ-10HR, we can further enable the advancement of EUV as the next HVM lithography technique.”
The EQ-10HR integrates easily into process tools and will run continuously at pulse repetition rates of 10 kHz for many billions of pulses.
Note to editors: Download photo of EQ-10HR at: http://www.energetiq.com/html/photos.html