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Inside the Energetiq Lab


  A look at the inner workings
of Energetiq's state of the art laboratory, where innovations in light are born.
 
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Energetiq Technology, Inc.
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LDLS (Laser-Driven Light Sources)        EUV       SXR      Custom Solutions       Datasheets/Technical Papers


Datasheets and Technical Papers


Datasheets (all are PDF files – double-click to download)

Energetiq LDLS EQ-1000 Laser-Driven Light Source datasheet

Energetiq LDLS EQ-99 Laser-Driven Light Source datasheet

Energetiq LDLS EQ-1500 / EQ-1510 Laser-Driven Light Source datasheet

Energetiq EQ-10 Series EUV Source datasheet

Energetiq EQ-10HR High Repetition Rate 10 kHz EUV Source datasheet

Energetiq EQ-10SX SXR Source datasheet

Technical Papers (all are PDF files – double-click to download)

Download Energetiq’s technical paper “Development of a High Pulse Rate EUV Source” from SPIE 2009

Energetiq Poster Presentations from the 2007 EUVL Symposium:

Beamline Design for the Energetiq EQ-10 EUV Source (PDF file)

EUV Source Development at Energetiq Technology (PDF file)

Energetiq’s Poster Presentation “Resist Outgassing and Exposure using the Energetiq Z-Pinch EUV Light Source” from the 2006 EUVL Symposium

Download the paper "A Novel, High-Brightness Electrodless Z-Pinch Soft X-Ray Source for Microbeam Applications," presented at the 7th International Workshop: Microbeam Probes of Cellular Radiation Response, Columbia University, New York, New York, March 2006.

Energetiq’s paper given at the 2006 SPIE Advanced Lithography Conference, February 2006

Trade Press Articles

Click here to read the article titled "Energetiq brings deep ultraviolet to life" in Optics and Laser Europe, (page 19), February 2009

Click here to read the article titled “Energetiq lasers light up lab research”,
Mass High Tech, January 9, 2009

Click here to see the article titled “Nano Development Toolkit Additions” in Semiconductor International, June 15, 2007, by Paula Doe, SEMI-San Jose, CA.

Click here to see the article titled “Infrastructure Steps Closer to EUV Lithography” in Semiconductor International, September 2005, by Aaron Hand, Managing Editor of Semiconductor International


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