EQ-10 Series Electrodeless Z-Pinch™
10 Watt EUV Source
Features & Benefits
• Unique patent-pending electrodeless Z-Pinch technology
--- Low debris / low consumable cost
• 10W into 2pi using Xenon
--- Sufficient power for a wide variety of applications
• Up to 2 kHz repetition rate
--- Continuous mode, 24/7
• Small plasma size
--- Below 1mm diameter
• Cost-effective and compact
--- Low cost per EUV Watt
--- Small footprint
• CE-Mark and SEMI S2-0703 compliant
Applications
• EUV Metrology
• EUV Resist Development
• Defect Inspection
• EUV Microscopy
Researchers into the emerging technology of EUV lithography need a source of EUV photons for a variety of applications. Existing sources of light are often too low in power, unreliable in operation, large, costly and complex.
The EQ-10 is a compact, easy-to-use, reliable and cost-effective EUV light source, based on Energetiq's proven Electrodeless Z-pinch™ technology using Xenon gas. The EQ-10 EUV source is uniquely suited for metrology and research applications.
The Energetiq EUV source is either integrated into a single 19" rack format (EQ-10M) or is standalone-ready to be integrated into a process tool (EQ-10RH). The system includes the electrodeless Z-pinch source assembly, vacuum and gas subsystems, power delivery subsystem, and control electronics. The EQ-10 is capable of delivering up to 10 Watts of in-band EUV into 2pi steradians, and will run continuously at pulse repetition rates of up to 2 kHz.
To accommodate the differing requirements of the various applications, the source operating conditions are user-adjustable. The EUV light output can be optimized for peak power or for peak brightness as required by the user. Plasma size is typically below 1mm in diameter under typical operating conditions. A simple and flexible optical interface is provided to the user on the side of the system enclosure to connect to the application equipment. Custom interfaces are available to meet specific customer requirements. The user interface operates by a color touch screen display, and incorporates menus allowing manual and automatic operation.
The EQ-10 is easy to install, requiring only electrical power, a chilled water supply, clean dry compressed air and a supply of Xenon. Footprint of the system is 600mm (W) x 900mm (D). The complete system rack height is 2000mm.
Download the EQ-10 Series EUV Source datasheet (PDF file)
Click here to learn about the EQ-10HR High Repetition Rate 10 kHz
EUV Source for HVM Simulation
Click here to see the article titled “Infrastructure Steps Closer to EUV Lithography” in Semiconductor International, September 2005, by Aaron Hand, Managing Editor of Semiconductor International
Download Energetiq’s Poster Presentation “Resist Outgassing and Exposure using the Energetiq Z-Pinch EUV Light Source” from the 2006 EUVL Symposium (PDF file)
Download a reprint of Energetiq’s paper given at the 2006 SPIE Advanced Lithography Conference, February 2006 (PDF file)
Download the following Energetiq Poster Presentations from the 2007 EUVL
Symposium:
Beamline Design for the Energetiq EQ-10 EUV Source (PDF file)
EUV Source Development at Energetiq Technology (PDF file)
